"Nanoscale domain growth dynamics of ferroelectric poly(vinylidene fluoride-co-trifluoroethylene) thin films"

Y. Kim*, W. Kim, H. Choi, S. Hong, H. Ko, H. Lee, K. No, Applied Physics Letters, 96 (1), 012908

"Memory effect of a single-walled carbon nanotube on nitride-oxide structure under various bias conditions"

H. Park, H. Shin, J. H. Kim, S. Hong, J. Xu, Applied Physics Letters, 96 (2), 023101

"Effect of deposition temperature on surface morphology and magnetic properties in epitaxial CoFe2O4 thin films deposited by metal organic chemical vapor depositon"

M. Pan*, G. Bai, Y. Liu, S. Hong, V. P. Dravid, A. K. Petford-Long, Journal of Applied Physics, 107 (4), 043908

"Effect of local surface potential distribution on its surface potential relaxation in polycrystalline ferroelectric films"

Y. Kim*, M. Park, S. Bühlmann, S. Hong, Y. K. Kim, H. Ko, J. Kim, K. No, Journal of Applied Physics, 107 (5), 054103

"Effects of Cantilever Buckling on Vector Piezoresponse Force Microscopy Imaging of Ferroelectric Domains in BiFeO3 Nanostructures"

R. Nath*, S. Hong, J. A. Klug, A. Imre, M. J. Bedzyk, R. S. Katiyar, O. Auciello, Applied Physics Letters, 96 (16), 163101

"Nanoscale piezoresponse of 70 nm poly(vinylidene fluoride-trifluoroethylene) films annealed at different temperatures"

Y.-Y. Choi, J. Hong*, S. Hong, K. No*, Physica Status Solidi - Rapid Research Letters, 4 (3-4), 94-96

"Effect of deposition temperature of TiO2 on the piezoelectric property of PbTiO3 film grown by PbO gas phase reaction sputtering"

J. Kim, S. Hong*, S. Bühlmann, Y. Kim, M. Park, Y. K. Kim, K. No*, Applied Physics Letters, 107 (10), 104112

"Three-dimensional ferroelectric domain imaging of epitaxial BiFeO3 thin films using angle-resolved piezoresponse force microscopy"

M. Park, S. Hong*, J. A. Klug, M. J. Bedzyk, O. Auciello, K. No*, A. Petford-Long, Applied Physics Letters, 97 (11), 112907

"Geometry- and Size-dependence of Electrical Properties of Metal Contacts on Semiconducting Nanowires"

H. Park*, R. Beresford, S. Hong, J. Xu,, Journal of Applied Physics, 108 (9), 094308