A Simulation Model for Thickness Profile of The Film Deposited Using Planar Circular Type Magnetron Sputtering Sources

Author

S. Hong*, E. Kim, Z. -T. Jiang, B. -S. Bae, S. -C. Lim, S. -G. Woo, Y. -B., Koh and K. No

Journal

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Vol

14(5)

Page

2721-2727

Year

1996

Link

https://doi.org/10.1116/1.580193 716회 연결