Multi-Step Chemical Solution Deposition-Annealing Process Toward Wake-Up Free Ferroelectricity in Y:HfO2 Films
- Journal
- Advanced Materials Interfaces
- Vol
- 8 (18)
- Page
- 2100907
- Year
- 2021
- Link
- https://doi.org/10.1002/admi.202100907 1451회 연결
Materials Imaging & Integration