Low-Temperature Growth of Ferroelectric Hf0.5Zr0.5O2 Thin Films Assisted by Deep Ultraviolet Light Irradiation
- Journal
- ACS Applied Electronic Materials
- Vol
- 3 (3)
- Page
- 1244-1251
- Year
- 2021
- Link
- https://doi.org/10.1021/acsaelm.0c01065 1148회 연결
Materials Imaging & Integration