Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation

Author

Z.-T. Jiang*, S. Hong, E. Kim, B.-S. Bae, S. Lim, S.-G. Woo, Y.-B. Koh and K. No

Journal

Applied Surface Science

Vol

113-114

Page

680-684

Year

1997

Link

https://doi.org/10.1016/S0169-4332(96)00933-6 755회 연결