Simulation and Fabrication of Attenuated Phase-Shifting Mask Author E. Kim, S. Hong, Z. -T. Jiang, S. -C. Lim, S. -G. Woo, Y. -B. Koh and K. No Journal Appl. Opt Vol 36 Page 7247-7256 Year 1997 Link https://doi.org/10.1364/AO.36.007247 750회 연결 검색 목록 이전글On measurement of optical band gap of chromium oxide films containing both crystalline and amorphous phases 24.04.05 다음글Effects of Gas Ring Position and Mesh Introduction on Film Quality and Thickness Uniformity 24.04.05