Optical property simulation of single-layer halftone phase shifting masks for DUV microlithography

Author

Z. -T. Jiang, S. Hong, E. Kim, B. -S. Bae, S. -C. Lim, S. -G. Woo, Y. -B. Koh and K. No

Journal

Semiconductor Science and Technology

Vol

11(10)

Page

1450-1455

Year

1996

Link

https://doi.org/10.1088/0268-1242/11/10/016 850회 연결