"A Simulation Model for Thickness Profile of The Film Deposited Using Planar Circular Type Magnetron Sputtering Sources"
S. Hong*, E. Kim, Z. -T. Jiang, B. -S. Bae, S. -C. Lim, S. -G. Woo, Y. -B., Koh and K. No,
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,
14(5),
2721-2727